The latest state-of-the-art lithography machines use EUV light to print extremely small structures on chips. EUV light with a wavelength of around 13.5 nanometers can be efficiently reflected using the most advanced multilayer mirrors. The light source in such machines is a tin plasma: a drop of tin that is heated by a laser to a point where it becomes plasma that emits EUV radiation. Exactly how this process takes place is one of the questions that ARCNL researcher Oscar Versolato hoped to answer with the ERC grant he received in 2018. Together with the American researcher James Colgan, his team succeeded in obtaining a far more complete and accurate answer to that question than had been possible up until now. Read more [Source: arcnl]