02/19/10 TSMC AND MAPPER REACHED JOINT DEVELOPMENT MILESTONE
Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) and MAPPER Lithography today revealed that a pre-alpha MAPPER tool located on TSMC’s Fab 12 GigaFab™ is repeatedly printing features previously unachievable using current immersion lithography technology...
07/21/09 CEA-Leti and MAPPER Lithography announce today that MAPPER has delivered one of its massively parallel electron beam platforms to CEA-Leti
CEA-Leti and MAPPER Lithography announce today that MAPPER has delivered one of its massively parallel electron beam platforms to CEA-Leti.This delivery is part of the collaboration program between MAPPER and CEA-Leti targeting development of maskless lithography for IC manufacturing for 22nm and beyond...
07/06/09 TSMC Joins the CEA-Leti Program on Multiple E-Beam Lithography for IC Manufacturing
TSMC and CEA-Leti, signed an agreement today in which TSMC will join the new industrial program IMAGINE, led by CEA-Leti, on maskless lithography for IC manufacturing. Intended to operate for three years, this program allows companies to assess a maskless lithography infrastructure for IC manufacturing and use MAPPER Technology as a solution towards high throughput...
MAPPER technology
MAPPER is working on a new, patented technology for making chips without a mask and using electron beams. This approach enables improved performance and reduces costs. The company´s major innovation is the use of one system through which more than 10,000 parallel electron beams can pass...
